writer：Xueyao Liu, Wendong Liu, Liping Fang, Shunsheng Ye, Huaizhong Shen, and Bai Yang.
keywords：deep-silver-nanowell arrays, colloidal lithography, nanohole, plasmonic, nanostructure, refractometric sensing
source：期刊
specific source：Nano Res.
Issue time：2017年

Large-area deep-silver-nanowell arrays (d-AgNWAs) for plasmonic sensing

were manufactured by combining colloidal lithography with metal deposition.

In contrast to most previous studies, we shed light on the outstanding sensitivity

afforded by deep metallic nanowells (up to 400 nm in depth). Using gold nanohole

arrays as a mask, a silicon substrate was etched into deep silicon nanowells,

which acted as a template for subsequent Ag deposition, resulting in the

formation of d-AgNWAs. Various geometric parameters were separately tailored

to study the changes in the optical performance and further optimize the sensing

ability of the structure. After several rounds of selection, the best sensing

d-AgNWA, which had a Ag thickness of 400 nm, template depth of 400 nm,

hole diameter of 504 nm, and period of 1 μm, was selected. It had a sensitivity

of 933 nm·RIU–1, which is substantially higher than those of most common thin

metallic nanohole arrays. As a proof of concept, the as-prepared structure was

employed as a substrate for an antigen-antibody recognition immunoassay,

which indicates its great potential for label-free real-time biosensing.