writer：Men Yonghong; Xiao Peng; Chen Jing; Fu Jun; Huang Youju; Zhang Jiawei; Xie Zhengchao; Wang Wenqin; Chen Tao*
keywords：Controlled Evaporative Self-Assembly
source：期刊
specific source：Langmuir 2014, 30, 4863?4867
Issue time：2014年

A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining

controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments.