[Langmuir] Controlled evaporative self-assembly of polyacrylic acid in a confined geometry for fabricating pattern ed polymer brushes
作者:Yonghong Men, Peng Xiao and Tao Chen* et al.
关键字:CESA, Polymer Brushes
论文来源:期刊
具体来源:Langmuir 2014, 30,4863-4867
发表时间:2014年
A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photo polymerization (SIPGP). Our method was carried out without any sophisticated instruments with lithograpy free, overcoming current difficulties in fabricating polymer patterns by using complex instruments.