作者：T. Chen, R. Jordan & S. Zauscher
关键字：polymer brush, soft lithography, patterning
论文来源：期刊
具体来源：Polymer, in press
发表时间：2011年

As a fast developing soft lithographic technique, the development of micro-contact printing (mCP) has exceeded the original aim of replicating poly(dimethylsiloxane) (PDMS) stamp patterns. Here we exploited several extended mCP strategies with various printing conditions (over-force or swelling induced physical deformation, and UV-Ozone treated chemical surface modi?cation to a PDMS stamp), combining with surface initiated atom transfer radical polymerization (SI-ATRP), to pattern complex
poly(N-isopropylacrylamide) (PNIPAAM) brush microstructures. These series of mCP strategies avoid the need for expensive and sophisticated instrumentation in patterning complex polymer brush micro-structures that do not exist on the original PDMS stamp