writer：Yonghong Men, Wenqin Wang, Peng Xiao, Jincui Gu, Aihua Sun, Youju Huang, Jiawei Zhang and Tao Chen*
keywords：controlled evaporative self-assembly, magnetic field, Fe3O4 nanoparticles, Polymer brushes
source：期刊
specific source：RSC Advances, 2015, 5, 31519-3152
Issue time：2015年

High fidelity and regularity structures of nanoscale materials opened up new opportunities for developing miniaturized devices. A simple yet robust approach of magnetic field assisted controlled evaporative self-assembly (CESA) is developed to achieve Fe₃O₄ nanoparticles (NPs) micro- and nano-patterns in two dimensional (2D) direction. In magnetic field assisted CESA process, the self-assembly morphology can be well controlled by varying extrinsic and intrinsic variables such as temperature, external magnetic field, and concentration of Fe₃O₄ NPs. Under the optimized magnetic field rotation frequency and temperature, 2D self-assembly of Fe₃O₄ NPs can be well realized. In addition, as photoactive sites, double bonds on the surface of Fe₃O₄ NPs allow the growth of polymer brushes by self-initiated photografting and photopolymerization (SIPGP), and the further achievement of free-standing magnetic composite film with well-defined patterns.